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Transformation of silicon nitride in oxygen plasmaJIMENEZ, C; PERRIERE, J; VICKRIDGE, I et al.Surface & coatings technology. 1991, Vol 45, Num 1-3, pp 147-154, issn 0257-8972, 8 p.Conference Paper

RBS study of In situ grown SiSrCaCuO films : Superconductors and superconductivityRANNO, L; PERRIERE, J; ENARD, J. P et al.Solid state communications. 1992, Vol 83, Num 1, pp 67-71, issn 0038-1098Article

Study of the growth mechanisms of amorphous carbon films by isotopic tracing methodsPERRIERE, J; LAURENT, A; ENARD, J. P et al.Materials science & engineering. B, Solid-state materials for advanced technology. 1992, Vol 11, Num 1-4, pp 347-351Conference Paper

Oxidation of Si and TiSi₂ thin films in rf oxygen plasmaPEREZ-CASERO, R; PERRIERE, J; ENARD, J. P et al.Journal of applied physics. 1991, Vol 69, Num 3, pp 1407-1410, issn 0021-8979Article

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Transformation of titanium nitride in oxygen plasmaJIMENEZ, C; PERRIERE, J; PALACIO, C et al.Thin solid films. 1993, Vol 228, Num 1-2, pp 247-251, issn 0040-6090Conference Paper

Plasma oxidation of TaSi_x thin filmsGOMEZ-SAN ROMAN, R; PEREZ-CASERO, R; ENARD, J. P et al.Applied surface science. 1991, Vol 53, pp 254-259, issn 0169-4332Conference Paper

Defects analysis of in situ grown BiSrCaCuO thin filmsRANNO, L; DEFOURNEAU, R. M; ENARD, J. P et al.Journal of alloys and compounds. 1993, Vol 195, pp 251-254, issn 0925-8388Conference Paper

Ion beam characterization of plasma oxide grown on TiSi_x (x > 2)CLIMENT-FONT, A; PERRIERE, J; PEREZ-CASERO, R et al.Applied surface science. 1991, Vol 53, pp 243-246, issn 0169-4332Conference Paper

Laser ablation of oxides : study of the oxygen incorporation by ¹⁸O isotopic tracing techniquesPEREZ CASERO, R; SAN ROMAN, R. G; MARECHAL, C et al.Applied surface science. 1996, Vol 96-98, pp 697-702, issn 0169-4332Conference Paper

Oxidation of tantalum silicide thin films in an RF oxygen plasmaGOMEZ-SAN ROMAN, R; PEREZ-CASERO, R; PERRIERE, J et al.Applied surface science. 1993, Vol 70-71, Num 1-4, pp 479-482, issn 0169-4332, BConference Paper